英国 Bede 科学仪器有限公司是全球 X
射线衍射分析仪器设计、制造的领导者， Bede 的产品可广泛用于高分辨和普通目的 X 射线衍射、半导体领域、药物化工领域。 作为 X
射线分析领域的旗手和开拓者， Bede 科学仪器有限公司一直致力在 X 射线领域提供各种高技术解决方案。目前全球有数百台 Bede
的产品在大学、研究所、工厂投入使用，其产品正被广泛用于高通量半导体制造等高技术领域。针对药物化工领域对自动化、复杂分析、可追踪测试 X
射线衍射分析越来越高的要求， Bede 开发出 BedeAnalyst 、 BedeMonitor 等成熟的解决方案。 Bede
的科学家成功解决了仪器系统的自动化管理问题并使之与世界工业标准一致。配合世界领先的分析控制软件， Bede
的系统可由非专业人员操作甚至可经由远程计算机控制运行。 可为用户提供免费样品测试，并提供完整测试报告。
QC200
双晶
X 射线衍射仪
主要功能：
-
高分辨
X 射线摇摆曲线
-
对称、非对称反射，准禁
002 反射测量
-
组成、厚度、驰豫（
relaxation
）、倾斜（
tilt ）测量
-
基底材料缺陷、
offcut 测量
-
用于
外延材料，量子阱、超晶格结构，
III-V 、
II-VI 、
IV-IV
半导体材料，
LEDs/ HBTs/ HEMTs
及激光器结构表征及质量控制
-
GaN 类
LEDs
、激光器结构，
SiGe 类
HBT 结构测量
技术特点：
-
200mm （
8” ）扫描
-
适合于洁净室使用（
100 级）
-
测角仪达到
1.0 arcsecond
分辨率
-
配
Microsource™光源
-
微区分析
BEDE D1 SYSTEM
*HIGH RESOLUTION X-RAY DIFFRACTION,
*GRAZING INCIDENCE REFLECTIVITY
*THIN FILM POWDER DIFFRACTION
Introduction
The Bede D1 System is new self-contained, flexible research diffractometer, designed to give all the most popular elements of a high resolution research
diffractometer, within the price range of a quality control system. This is made possible by advanced design and state-of-the-art components, for example
the specimen and detector axes use motors and encoders which give an accuracy of 0.18 arcsecond precision.
As the D1 is self contained in an X-ray safety enclosure with integral safety interlocks, it is ideally suited to universities and industrial process
development laboratories working on thin film of metals, polymers, ceramics and semiconductors and on epitaxial compound semiconductors.
Combined with the range of Bede accessories and software, the Bede D1 System gives you the power to achieve:
· Single and Double Crystal Diffraction
· Parallel-beam optic XRD for Thin Film Polycrystalline films
· Powder diffraction with Bragg-Bretano geometry
· High Resolution XRD for epilayer measurement
· Triple Axis HRXRD for Reciprocal Space Mapping(separating the effects of crystal tilts and mismatch from stress)
· Bond and Bowen-Tanner lattice parameter measurement methods
· Grazing incidence X-ray reflectivity
· Grazing incidence X-ray diffuse scatter
· Texture Mapping
Bede QC200 X-ray Diffractometer
X-RAY DIFFRACTION AND WAFER MAPPING
Introduction
systems and samples with highly mis-oriented substrates.
The QC200 is aimed at providing the highest quality data with the maximum throughput of samples.
The QC200 diffractometer is totally integrated in a cabinet, requires only mains electricity services and takes up a minimum of floor space,
making it the ideal instrument
for quality analysis of a wide range of semiconductor substrates
and epitaxial layers in a clean room environment. A range of generator options is available to maximise the sample throughput.
Outstanding features of this instrument are:
· Compact High Resolution Scanning Diffractometer for Process Control
· The new Microsource X-ray generator allowing upgrade to high-brightness sub-mm spot sizes
· Horizontal specimen mounting no adhesives required
· Rapid sample throughput
· Complete 200mm wafer mapping capability
· Asymmetric reflections accessible with new motorised detector axis
· Pre-Aligned reference crystal supplied in quick-change block
· Completely self contained in radiation safe freestanding cabinet
· Bede Control Windows instrument control software
参考资料：
特点：分辨率高，可根据不同的测试对象选择不同的光路，
X-ray最小展宽低达4.5秒。样品台可放置6到12英寸的硅片，适合分析各种单晶、多晶薄膜的结晶质量和应力状态等。
http://silab.zju.edu.cn/film/xrd.htm
http://ipoe.tongji.edu.cn/researchfield/xray/xray.htm
